Microdot — Microstructured and optical tools for process control for the industrial doping of highly efficient power semiconductor components (Q3539807): Difference between revisions

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Revision as of 07:29, 18 November 2021

Project Q3539807 in Germany
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Microdot — Microstructured and optical tools for process control for the industrial doping of highly efficient power semiconductor components
Project Q3539807 in Germany

    Statements

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    559,909.61 Euro
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    699,887.01 Euro
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    80.0 percent
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    1 January 2020
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    30 June 2022
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    Ernst-Abbe-Hochschule Jena University of Applied Sciences
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    50°54'32.44"N, 11°34'31.40"E
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    07745 Jena
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    Im Vorhaben sollen neuartige Konzepte zur Kontrolle industrieller Leistungshalbleiterdotierung auf Basis von Ionenimplantation grundlegend erforscht werden. Moderne Verfahren der Ionenimplantation, wie etwa die Microdegrader-Technik ermöglichen die Produktion besonders effizienter Leistungshalbleiterbauelemente. Ziel des Vorhabens ist es eine gänzlich von Ladungseffekten unabhängige, allein auf ioneninduzierte optische oder topologische Materialmodifikation basierende Prozesskontroll- bzw. Charakterisierungssensorik grundlegend (TRL 1-4) zu erforschen. (German)
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    The project will fundamentally investigate novel concepts for the control of industrial power semiconductor doping based on ion implantation. Modern methods of ion implantation, such as microdegrader technology, enable the production of particularly efficient power semiconductor components. The aim of the project is to fundamentally investigate process control and characterisation sensors based entirely on charge effects based solely on ion-induced optical or topological material modification (TRL 1-4). (English)
    17 November 2021
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    Identifiers

    DE_TEMPORARY_ESF_135719
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