Q3297336 (Q3297336): Difference between revisions
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(Changed label, description and/or aliases in en: Setting new description) |
(Created claim: summary (P836): New fields of application in nanooptics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and closed dielectric and metallic films with precise controllable thickness. In the case of the atomic deposition (ALD), individual monolayers of the material are raised on the sample via gaseous starting substances. These substances can penetrate the sample completely and therefore also apply material...) |
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New fields of application in nanooptics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and closed dielectric and metallic films with precise controllable thickness. In the case of the atomic deposition (ALD), individual monolayers of the material are raised on the sample via gaseous starting substances. These substances can penetrate the sample completely and therefore also apply material in shaded areas. Due to the atomic layer-like coating, a highly precise layer thickness control process immanent is given. In addition to dielectrics, metals and metal compounds can also be applied. These novel material films allow the structuring of complex two- and three-dimensional micro- and nanostructures on an unprecedented level and enable completely new imaging systems and optics. The ALD is set up as a core facility in the center of ZAQuant within the framework of IQST. (English) | |||||||||||||||
| Property / summary: New fields of application in nanooptics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and closed dielectric and metallic films with precise controllable thickness. In the case of the atomic deposition (ALD), individual monolayers of the material are raised on the sample via gaseous starting substances. These substances can penetrate the sample completely and therefore also apply material in shaded areas. Due to the atomic layer-like coating, a highly precise layer thickness control process immanent is given. In addition to dielectrics, metals and metal compounds can also be applied. These novel material films allow the structuring of complex two- and three-dimensional micro- and nanostructures on an unprecedented level and enable completely new imaging systems and optics. The ALD is set up as a core facility in the center of ZAQuant within the framework of IQST. (English) / rank | |||||||||||||||
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| Property / summary: New fields of application in nanooptics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and closed dielectric and metallic films with precise controllable thickness. In the case of the atomic deposition (ALD), individual monolayers of the material are raised on the sample via gaseous starting substances. These substances can penetrate the sample completely and therefore also apply material in shaded areas. Due to the atomic layer-like coating, a highly precise layer thickness control process immanent is given. In addition to dielectrics, metals and metal compounds can also be applied. These novel material films allow the structuring of complex two- and three-dimensional micro- and nanostructures on an unprecedented level and enable completely new imaging systems and optics. The ALD is set up as a core facility in the center of ZAQuant within the framework of IQST. (English) / qualifier | |||||||||||||||
point in time: 24 October 2021
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Revision as of 16:05, 24 October 2021
Project Q3297336 in Germany
| Language | Label | Description | Also known as |
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| English | No label defined |
Project Q3297336 in Germany |
Statements
260,000.0 Euro
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520,000.0 Euro
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50.0 percent
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14 November 2017
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31 December 2019
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Universität Stuttgart
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Neue Anwendungsfelder in der Nanooptik und Plasmonik erfordern die konformale Beschichtung komplexer zwei- und dreidimensionaler Komponenten mit dichten und geschlossenen dielektrischen und metallischen Filmen mit präzise kontrollierbarer Dicke. Bei der Atomlagendeposition (ALD) werden einzelne Monolagen des Materials via gasförmiger Ausgangssubstanzen auf der Probe aufgewachsen. Diese Substanzen können die Probe vollständig durchdringen und tragen daher auch Material in abgeschatteten Bereichen auf. Aufgrund der atomlagenweisen Beschichtung ist eine höchstpräzise Schichtdickenkontrolle prozessimmanent gegeben. Neben Dielektrika lassen sich auch Metalle und Metallverbindungen aufbringen. Diese neuartigen Materialfilme erlauben die Strukturierung von komplexen zwei- und dreidimensionalen Mikro- und Nanostrukturen auf bisher unerreichter Ebene und ermöglichen völlig neue Abbildungssyteme und Optiken. Die ALD wird als Core Facility im Zentrum ZAQuant im Rahmen von IQST eingerichtet. (German)
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New fields of application in nanooptics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and closed dielectric and metallic films with precise controllable thickness. In the case of the atomic deposition (ALD), individual monolayers of the material are raised on the sample via gaseous starting substances. These substances can penetrate the sample completely and therefore also apply material in shaded areas. Due to the atomic layer-like coating, a highly precise layer thickness control process immanent is given. In addition to dielectrics, metals and metal compounds can also be applied. These novel material films allow the structuring of complex two- and three-dimensional micro- and nanostructures on an unprecedented level and enable completely new imaging systems and optics. The ALD is set up as a core facility in the center of ZAQuant within the framework of IQST. (English)
24 October 2021
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Stuttgart
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Identifiers
DE_TEMPORARY_115
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