Revision history of "Microdot — Microstructured and optical tools for process control for the industrial doping of highly efficient power semiconductor components" (Q3539807)

Jump to navigation Jump to search

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

22 March 2024

16 February 2024

12 June 2023

15 July 2022

  • curprev 20:3420:34, 15 July 2022DG Regio talk contribs 48,282 bytes +31,507 Changed label, description and/or aliases in da, el, hr, ro, sk, mt, pt, fi, pl, sl, cs, lt, lv, bg, hu, ga, sv, et, nl, fr, de, it, es, and other parts: Adding translations: da, el, hr, ro, sk, mt, pt, fi, pl, sl, cs, lt, lv, bg, hu, ga, sv, et,

23 January 2022

20 January 2022

21 December 2021

9 December 2021

21 November 2021

18 November 2021

17 November 2021

  • curprev 22:1922:19, 17 November 2021DG Regio talk contribs 9,434 bytes +203 Changed label, description and/or aliases in en: translated_label
  • curprev 22:1922:19, 17 November 2021DG Regio talk contribs 9,231 bytes +1,330 Created claim: summary (P836): The project will fundamentally investigate novel concepts for the control of industrial power semiconductor doping based on ion implantation. Modern methods of ion implantation, such as microdegrader technology, enable the production of particularly efficient power semiconductor components. The aim of the project is to fundamentally investigate process control and characterisation sensors based entirely on charge effects based solely on ion-indu...

7 November 2021

6 November 2021