Polarity Engineering in Nitride Heterostructures (Q84349)
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Project Q84349 in Poland
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Polarity Engineering in Nitride Heterostructures |
Project Q84349 in Poland |
Statements
798,555.0 zloty
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798,555.0 zloty
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100.0 percent
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1 October 2018
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30 September 2020
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INSTYTUT WYSOKICH CIŚNIEŃ POLSKIEJ AKADEMII NAUK
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The project focuses on nitride vertical devices with inverted built-in polarization fields in structures grown on Ga-polar GaN substrates. To build such devices we will exploit unique features of n-p tunnel junctions (TJ). Growth of n-p TJ preceding the active region of the device allows to incorporate the active region within the p-n configuration rather than the commonly used n-p one. This results in an inverted built-in electric field direction inside the active region. Additionally, such devices will profit from having the n-type layer on the top. We will show that both features can lead to new applications of light emitting devices, laser diodes and transistors. Unique capabilities of the plasma-assisted molecular beam epitaxy system (high growth rate nitrogen plasma source, high Mg flux cell and Ge doping) installed in Warsaw will be crucial for samples growth. Project will be carried out in collaboration with groups at Cornell University and Wroclaw University of Technology. (Polish)
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The project focuses on Nitride vertical devices with inverted built-in polarisation fields in structures grown on Ga-polar GaN substrates. To build such devices we will exploit unique features of n-p tunnel junctions (TJ). Growth of n-p TJ preceding the active region of the device allows to Incorporate the active region within the p-n configuration rather than the commonly used n-p one. This results in an inverted built-in electric field direction inside the active region. Additionally, such devices will profit from having the n-type layer on the top. We will show that both features can lead to new applications of light emitting devices, laser diodes and transistors. Unique capabilities of the plasma-assisted molecular beam epitaxy system (high growth rate nitrogen plasma source, high Mg flux cell and Ge doping) installed in Warsaw will be crucial for samples growth. Project will be carried out in collaboration with groups at Cornell University and Wroclaw University of Technology. (English)
14 October 2020
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Le projet se concentre sur les dispositifs verticaux Nitride avec des champs de polarisation intégrés inversés dans des structures cultivées sur Ga-polar GaN Substrates. Pour construire de tels appareils, nous exploiterons les caractéristiques uniques des jonctions de tunnel n-p (TJ). La croissance de n-p TJ précédant la région active de l’appareil permet d’incorporer la région active dans la configuration p-n plutôt que la n-p un couramment utilisée. Il en résulte une direction de champ électrique intégrée inversée à l’intérieur de la région active. En outre, ces appareils profiteront d’avoir la couche de type n sur le dessus. Nous montrerons que les deux fonctionnalités peuvent conduire à de nouvelles applications d’appareils émettant de la lumière, de diodes laser et de transistors. Les capacités uniques du système Epitaxy à faisceau moléculaire assisté par plasma (source plasmatique à taux de croissance élevé, cellule à flux élevé de Mg et dopage Ge) seront cruciales pour la croissance des échantillons. Le projet sera réalisé en collaboration avec des groupes de l’Université Cornell et de l’Université de technologie de Wroclaw. (French)
30 November 2021
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Identifiers
POIR.04.04.00-00-5D5B/18
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