INNOVATIVE ELECTROPLATING TECHNOLOGY OF HIGH ENTROPY ALLOYS (Q4241782): Difference between revisions
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(Changed label, description and/or aliases in en: Setting new description) |
(Changed label, description and/or aliases in en, and other parts: Adding English translations) |
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INNOVATIVE ELECTROPLATING TECHNOLOGY OF HIGH ENTROPY ALLOYS | |||||||||||||||
| Property / summary | |||||||||||||||
THE GENERAL OBJECTIVE OF THE PROPOSED INDUSTRIAL RESEARCH PROJECT IS THE STUDY OF A NEW ELECTROPLATING METHODOLOGY, FOR THE REALISATION OF INNOVATIVE HIGH ENTROPY ALLOYS, BASED ON THE TECHNOLOGY COVERED BY A COMPANY PATENT CALLED DLD/DLM — DYNAMIC LIQUID DROP/MENISCUS. USING THE DLD/DLM TECHNIQUE, A MULTI-LAYER SEQUENTIAL STORAGE APPROACH WILL BE STUDIED FOR THE REALISATION OF BINARY, TERNARY, QUATERNARY AND, BETTER, HIGH ENTROPY ALLOYS WITH HIGH PRODUCTIVITY, HIGH PRECISION AND LOW COST. THE ALLOYS THUS MANUFACTURED WILL THEN BE COMPOSED OF HUNDREDS OF ALTERNATE LAYERS OF THE INDIVIDUAL METALS DEPOSITED IN SEQUENCE AND THE DEPOSIT LAYERS WILL HAVE THICKNESSES OF A FEW TENS OF NANOMETERS THUS ENSURING THE SELF-DISSEMINATION OF THE INDIVIDUAL ELEMENTS IN ORDER TO ALLOW THE OBTAINING OF HOMOGENEOUS ALLOYS WITHOUT THE NEED FOR THERMAL RECASTING. THE NEW MATERIALS UNDER STUDY (HIGH ENTROPY ALLOYS) AND THE CONNECTED INNOVATIV (English) | |||||||||||||||
| Property / summary: THE GENERAL OBJECTIVE OF THE PROPOSED INDUSTRIAL RESEARCH PROJECT IS THE STUDY OF A NEW ELECTROPLATING METHODOLOGY, FOR THE REALISATION OF INNOVATIVE HIGH ENTROPY ALLOYS, BASED ON THE TECHNOLOGY COVERED BY A COMPANY PATENT CALLED DLD/DLM — DYNAMIC LIQUID DROP/MENISCUS. USING THE DLD/DLM TECHNIQUE, A MULTI-LAYER SEQUENTIAL STORAGE APPROACH WILL BE STUDIED FOR THE REALISATION OF BINARY, TERNARY, QUATERNARY AND, BETTER, HIGH ENTROPY ALLOYS WITH HIGH PRODUCTIVITY, HIGH PRECISION AND LOW COST. THE ALLOYS THUS MANUFACTURED WILL THEN BE COMPOSED OF HUNDREDS OF ALTERNATE LAYERS OF THE INDIVIDUAL METALS DEPOSITED IN SEQUENCE AND THE DEPOSIT LAYERS WILL HAVE THICKNESSES OF A FEW TENS OF NANOMETERS THUS ENSURING THE SELF-DISSEMINATION OF THE INDIVIDUAL ELEMENTS IN ORDER TO ALLOW THE OBTAINING OF HOMOGENEOUS ALLOYS WITHOUT THE NEED FOR THERMAL RECASTING. THE NEW MATERIALS UNDER STUDY (HIGH ENTROPY ALLOYS) AND THE CONNECTED INNOVATIV (English) / rank | |||||||||||||||
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| Property / summary: THE GENERAL OBJECTIVE OF THE PROPOSED INDUSTRIAL RESEARCH PROJECT IS THE STUDY OF A NEW ELECTROPLATING METHODOLOGY, FOR THE REALISATION OF INNOVATIVE HIGH ENTROPY ALLOYS, BASED ON THE TECHNOLOGY COVERED BY A COMPANY PATENT CALLED DLD/DLM — DYNAMIC LIQUID DROP/MENISCUS. USING THE DLD/DLM TECHNIQUE, A MULTI-LAYER SEQUENTIAL STORAGE APPROACH WILL BE STUDIED FOR THE REALISATION OF BINARY, TERNARY, QUATERNARY AND, BETTER, HIGH ENTROPY ALLOYS WITH HIGH PRODUCTIVITY, HIGH PRECISION AND LOW COST. THE ALLOYS THUS MANUFACTURED WILL THEN BE COMPOSED OF HUNDREDS OF ALTERNATE LAYERS OF THE INDIVIDUAL METALS DEPOSITED IN SEQUENCE AND THE DEPOSIT LAYERS WILL HAVE THICKNESSES OF A FEW TENS OF NANOMETERS THUS ENSURING THE SELF-DISSEMINATION OF THE INDIVIDUAL ELEMENTS IN ORDER TO ALLOW THE OBTAINING OF HOMOGENEOUS ALLOYS WITHOUT THE NEED FOR THERMAL RECASTING. THE NEW MATERIALS UNDER STUDY (HIGH ENTROPY ALLOYS) AND THE CONNECTED INNOVATIV (English) / qualifier | |||||||||||||||
point in time: 2 February 2022
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Revision as of 06:30, 2 February 2022
Project Q4241782 in Italy
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | INNOVATIVE ELECTROPLATING TECHNOLOGY OF HIGH ENTROPY ALLOYS |
Project Q4241782 in Italy |
Statements
52,245.0 Euro
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104,490.0 Euro
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50.0 percent
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RISE TECHNOLOGY S.R.L.
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OBIETTIVO GENERALE DEL PROGETTO DI RICERCA INDUSTRIALE PROPOSTO E' LO STUDIO DI UNA NUOVA METODOLOGIA DI ELETTRODEPOSIZIONE GALVANICA, PER LA REALIZZAZIONE DI INNOVATIVE LEGHE AD ALTA ENTROPIA, BASATA SULLA TECNICA OGGETTO DI BREVETTO AZIENDALE DENOMINATA DLD/DLM - DYNAMIC LIQUID DROP/MENISCUS. MEDIANTE LA TECNICA DLD/DLM SI STUDIERA' UN APPROCCIO DI DEPOSITO SEQUENZIALE MULTISTRATO PER LA REALIZZAZIONE DI LEGHE DI SALDATURA BINARIE, TERNARIE, QUATERNARIE E, MEGLIO, LEGHE AD ALTA ENTROPIA CON ELEVATA PRODUTTIVITA', ALTA PRECISIONE E A BASSO COSTO. LE LEGHE COSI' FABBRICATE SARANNO QUINDI COMPOSTE DA CENTINAIA DI STRATI ALTERNATI DEI SINGOLI METALLI DEPOSITATI IN SEQUENZA E GLI STRATI DI DEPOSITO AVRANNO SPESSORI DI POCHE DECINE DI NANOMETRI GARANTENDO COSI' L'AUTO-DIFFUSIONE STESSA DEI SINGOLI ELEMENTI IN MODO DA PERMETTERE L'OTTENIMENTO DI LEGHE OMOGENEE SENZA NECESSITA' DI RIFUSIONE TERMICA. I NUOVI MATERIALI OGGETTO DI STUDIO (LEGHE AD ALTA ENTROPIA) E LA CONNESSA INNOVATIV (Italian)
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THE GENERAL OBJECTIVE OF THE PROPOSED INDUSTRIAL RESEARCH PROJECT IS THE STUDY OF A NEW ELECTROPLATING METHODOLOGY, FOR THE REALISATION OF INNOVATIVE HIGH ENTROPY ALLOYS, BASED ON THE TECHNOLOGY COVERED BY A COMPANY PATENT CALLED DLD/DLM — DYNAMIC LIQUID DROP/MENISCUS. USING THE DLD/DLM TECHNIQUE, A MULTI-LAYER SEQUENTIAL STORAGE APPROACH WILL BE STUDIED FOR THE REALISATION OF BINARY, TERNARY, QUATERNARY AND, BETTER, HIGH ENTROPY ALLOYS WITH HIGH PRODUCTIVITY, HIGH PRECISION AND LOW COST. THE ALLOYS THUS MANUFACTURED WILL THEN BE COMPOSED OF HUNDREDS OF ALTERNATE LAYERS OF THE INDIVIDUAL METALS DEPOSITED IN SEQUENCE AND THE DEPOSIT LAYERS WILL HAVE THICKNESSES OF A FEW TENS OF NANOMETERS THUS ENSURING THE SELF-DISSEMINATION OF THE INDIVIDUAL ELEMENTS IN ORDER TO ALLOW THE OBTAINING OF HOMOGENEOUS ALLOYS WITHOUT THE NEED FOR THERMAL RECASTING. THE NEW MATERIALS UNDER STUDY (HIGH ENTROPY ALLOYS) AND THE CONNECTED INNOVATIV (English)
2 February 2022
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SAN MARTINO DI LUPARI
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