Filing of a patent application for a PCT procedure for the production method of ultra-thin conductive metallic lines (Q81659): Difference between revisions

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(‎Created claim: summary (P836): Reference_reference_programme_aids:SA.42799 (2015/X), public funding:Article 28 of Commission Regulation (EC) No 651/2014Przedmiotem is designed to carry out an international patent application procedure for the production method of ultra-thin conductive metallic lines.Filip Granek and Dr FilipZbigniew Rozyk.They are both recipients of the Foundation for Polish Science and MNiSW.The two researchers, for more than 8 years, have all worked scienti...)
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Reference_reference_programme_aids:SA.42799 (2015/X), public funding:Article 28 of Commission Regulation (EC) No 651/2014Przedmiotem is designed to carry out an international patent application procedure for the production method of ultra-thin conductive metallic lines.Filip Granek and Dr FilipZbigniew Rozyk.They are both recipients of the Foundation for Polish Science and MNiSW.The two researchers, for more than 8 years, have all worked scientifically in prestigious scientific bodies outside Poland:F. Granek worked in the Netherlands, Germany, Australia and China.Mr Rozinek worked in Austria, the United Kingdom, Sweden and Norway.They are the authors of many publications in prestigious scientific journals, including Nature, and F. Granie is the author of several international patent applications.The idea of the groundbreaking method of manufacturing ultra-thin conductive metallic lines was created at the intersection of their competences and scientific experience.The R & D work carried out so far has led to the development of a technological method through which a metallic conductive path of 5 μm is generated!(the method of manufacture is the subject of the notification).For comparison, the standardised printing technology of nanomaterials allows for a line width in the range of 50-100 um.At the same time, the electrical resistance of the individual manufactured lines shall be 3 Ohm for a line 1 cm long.The development of a process of technological development is therefore extremely promising in terms of the possibility of obtaining very thin and highly conducting metallic lines, so that the purpose of the proposed notification is a response to the growing market in the market. (English)
Property / summary: Reference_reference_programme_aids:SA.42799 (2015/X), public funding:Article 28 of Commission Regulation (EC) No 651/2014Przedmiotem is designed to carry out an international patent application procedure for the production method of ultra-thin conductive metallic lines.Filip Granek and Dr FilipZbigniew Rozyk.They are both recipients of the Foundation for Polish Science and MNiSW.The two researchers, for more than 8 years, have all worked scientifically in prestigious scientific bodies outside Poland:F. Granek worked in the Netherlands, Germany, Australia and China.Mr Rozinek worked in Austria, the United Kingdom, Sweden and Norway.They are the authors of many publications in prestigious scientific journals, including Nature, and F. Granie is the author of several international patent applications.The idea of the groundbreaking method of manufacturing ultra-thin conductive metallic lines was created at the intersection of their competences and scientific experience.The R & D work carried out so far has led to the development of a technological method through which a metallic conductive path of 5 μm is generated!(the method of manufacture is the subject of the notification).For comparison, the standardised printing technology of nanomaterials allows for a line width in the range of 50-100 um.At the same time, the electrical resistance of the individual manufactured lines shall be 3 Ohm for a line 1 cm long.The development of a process of technological development is therefore extremely promising in terms of the possibility of obtaining very thin and highly conducting metallic lines, so that the purpose of the proposed notification is a response to the growing market in the market. (English) / rank
 
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Revision as of 09:06, 4 March 2020

Project in Poland financed by DG Regio
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English
Filing of a patent application for a PCT procedure for the production method of ultra-thin conductive metallic lines
Project in Poland financed by DG Regio

    Statements

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    315,682.0 zloty
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    75,763.68 Euro
    13 January 2020
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    638,264.0 zloty
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    153,183.36 Euro
    13 January 2020
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    50.0 percent
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    18 January 2016
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    31 March 2020
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    XTPL SA
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    Numer_referencyjny_programu_pomocowego: SA.42799(2015/X), przeznaczenie_pomocy_publicznej: art. 28 rozporządzenia Komisji nr 651/2014Przedmiotem projektu jest przeprowadzenie procedury międzynarodowego zgłoszenia patentowego dla metody wytwarzania ultra-cienkich przewodzących linii metalicznych Poprzez podjęcie działań zmierzających do uzyskania ochrony własności przemysłowej Spółka XTPL Sp z o.o. (dalej jako XTPL) znacząco przybliży się do zrealizowania głównego celu swojej działalności tj. komercjalizacji pomysłu technologicznego jaki stworzyli wybitni młodzi polscy naukowcy dr inż. Filip Granek oraz dr inż. Zbigniew Rozynek. Obaj są stypendystami Fundacji na rzecz Nauki Polskiej oraz MNiSW. Obaj naukowcy, przez ponad 8 lat każdy, pracowali naukowo w prestiżowych jednostkach naukowych poza granicami Polski: F. Granek pracował w Holandii, Niemczech, Australii oraz Chinach. Z. Rozynek pracował w Austrii, Wielkiej Brytanii, Szwecji oraz Norwegii. Są oni autorami wielu publikacji w prestiżowych czasopismach naukowych w tym Nature, a F. Granek jest autorem kilkunastu międzynarodowych zgłoszeń patentowych. Pomysł na przełomową metodę wytwarzania ultra-cienkich przewodzących linii metalicznych powstał na styku ich kompetencji oraz doświadczeń naukowych. Przeprowadzone dotychczas prace B+R doprowadziły do opracowania metody technologicznej, dzięki której wytworzono metaliczne ścieżki przewodzące o szerokości 5 mikrometrów! (metoda ich wytwarzania stanowi przedmiot zgłoszenia). Dla porównania standardowo wykorzystywane techniki druku nanomateriałów pozwalają na uzyskanie szerokości linii w zakresie 50-100 um. Jednocześnie rezystancja elektryczna pojedynczych wytworzonych linii wynosi 3 Ohm dla linii o długości 1 cm. Rozwijany proces technologiczny jest zatem niezwykle obiecujący z punktu widzenia możliwości uzyskania bardzo cienkich i bardzo dobrze przewodzących linii metalicznych, dzięki czemu przedmiot planowanego zgłoszenia stanowi odpowiedź na rosnące na rynku zapotrze (Polish)
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    Reference_reference_programme_aids:SA.42799 (2015/X), public funding:Article 28 of Commission Regulation (EC) No 651/2014Przedmiotem is designed to carry out an international patent application procedure for the production method of ultra-thin conductive metallic lines.Filip Granek and Dr FilipZbigniew Rozyk.They are both recipients of the Foundation for Polish Science and MNiSW.The two researchers, for more than 8 years, have all worked scientifically in prestigious scientific bodies outside Poland:F. Granek worked in the Netherlands, Germany, Australia and China.Mr Rozinek worked in Austria, the United Kingdom, Sweden and Norway.They are the authors of many publications in prestigious scientific journals, including Nature, and F. Granie is the author of several international patent applications.The idea of the groundbreaking method of manufacturing ultra-thin conductive metallic lines was created at the intersection of their competences and scientific experience.The R & D work carried out so far has led to the development of a technological method through which a metallic conductive path of 5 μm is generated!(the method of manufacture is the subject of the notification).For comparison, the standardised printing technology of nanomaterials allows for a line width in the range of 50-100 um.At the same time, the electrical resistance of the individual manufactured lines shall be 3 Ohm for a line 1 cm long.The development of a process of technological development is therefore extremely promising in terms of the possibility of obtaining very thin and highly conducting metallic lines, so that the purpose of the proposed notification is a response to the growing market in the market. (English)
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    Identifiers

    POIR.02.03.04-02-0001/16
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